McBain MMS200
Fully Automatic Mask Alignment Microscope and Handling System
The McBain MMS200 is the affordable solution for small-field, g-line, sub-micron stepping mask alignment. Used extensively in thin film head production and micromachining/MEMS fabrication, it is the ideal photolithography tool for maximizing throughput while minimizing production costs. It is available with manual or motorized options for loading/unloading masks and sliders.
Key Features
- Small field g-line stepper (436nm exposure)
- Vision and alignment at 546nm
- 5:1 mask reduction ratio
- Apochromatic lens NA: 0.2
- 1000W HgXe illuminator
- FOV: 20mm x 20mm
- Resolution: 1.7µm
- 6” x 6” mask holder
- Split-field camera machine vision system
- 4 motorized axes for alignment and motion: X,Y,Z and theta
- Large depth of focus: 5.4 µm
- Manual or motorized options for load and unload of mask and sliders
- Designed for serviceability and minimum footprint
- SECS/GEM interface
- Configurable product parameters:
- Slider width and length
- Slider rows and columns
- Exposure area rows and columns
- Target spacing
- Post-align offsets
- Exposure dosage
- Graphic site selections
- Control components have individually accessible dialogs for troubleshooting and maintenance